90~130nm minimum microchip feature Copper Characterization with TEOS or Black Diamond Low-k ILD on the single crystal silicon wafer. Wafer Pattern May Vary from the Product Images. Great to be used as gift, display object, exhibition, educating demonstration, testing, decoration or your collection.
12 inch Integrated Circuits Silicon Wafer Made by Copper Process
Each wafer may show slight variation in pattern, depending on production characteristics. Unpolished wafer surface. Wafer pattern may vary from product images. An integrated circuit is consisted by a set of electronic circuits on a flat silicon wafer.
Integrated Circuits Silicon Wafer Made by Copper Process (12 Inch)
Wafer Pattern May Vary from the Product Images. Great to be used as gift, display object, exhibition, educating demonstration, testing, decoration or your collection. 90~130nm minimum microchip feature Copper Characterization with TEOS or Black Diamond Low-k ILD on the single crystal silicon wafer.
Integrated Circuits Silicon Wafer Made by Copper Process (12 Inch) 12 Inch
Wafer Pattern May Vary from the Product Images. Great to be used as gift, display object, exhibition, educating demonstration, testing, decoration or your collection. 90~130nm minimum microchip feature Copper Characterization with TEOS or Black Diamond Low-k ILD on the single crystal silicon wafer.
